Method for depositing magnetic material film

磁性材膜の成膜方法

Abstract

(57)【要約】 【課題】厚い磁性材ターゲットでマグネトロンスパッタ リングにより高い成膜速度で成膜できる磁性材膜の成膜 方法の提供。 【解決手段】厚さ方向の最大透磁率が厚さ方向と垂直な 方向の最大透磁率の2倍以上である磁性材ターゲットを 用いてマグネトロンスパッタリングする磁性材膜の成膜 方法。
PROBLEM TO BE SOLVED: To provide a method for depositing a magnetic material film by which film deposition can be performed at a high film deposition rate by magnetron sputtering with a thick magnetic material target. SOLUTION: In this method for depositing a magnetic material film, magnetron sputtering is performed by using a magnetic material target in which the maximum magnetic permeability in the thickness direction is double or above the maximum magnetic permeability in the direction vertical to the thickness direction.

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